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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Efficient hardware usage in the mask tapeout flow
Boman, Mathias, Levinson, Harry J., Dusa, Mircea V., Brist, Travis, Wang, YongdongVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.815019
File:
PDF, 484 KB
english, 2009