SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Development of polymers for non-CAR resists for EUV lithography
Whittaker, Andrew K., Henderson, Clifford L., Blakey, Idriss, Blinco, James, Jack, Kevin S., Lawrie, Kirsten, Liu, Heping, Yu, Anguang, Leeson, Michael, Yeuh, Wang, Younkin, ToddVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.820493
File:
PDF, 473 KB
english, 2009