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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Patterning of 90nm node flash contact hole with assist feature using KrF
Shim, Yeonah, Zurbrick, Larry S., Montgomery, M. Warren, Jun, Sungho, Choi, Jaeyoung, Choi, Kwangseon, Han, Jae-won, Wang, Kechang, McCarthy, John, Xiao, Guangming, Dai, Grace, Son, DongHwan, Zhou, XiVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.833499
File:
PDF, 2.31 MB
english, 2009