SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology
Platzgummer, Elmar, Montgomery, M. Warren, Maurer, Wilhelm, Cernusca, Stefan, Klein, Christof, Klikovits, Jan, Kvasnica, Samuel, Loeschner, HansVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.864261
File:
PDF, 4.35 MB
english, 2010