SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Addressing 3D metrology challenges by using a multiple detector CDSEM
Hiroyama, Mitsuo, Maurer, Wilhelm, Abboud, Frank E., Murakawa, Tsutomu, Kuribara, Masayuki, Iwai, Toshimichi, Soma, Minoru, Iko, Ikuo, Seyama, Masahiro, Matsumoto, Jun, Nakamura, Takayuki, Hakii, HideVolume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.896982
File:
PDF, 3.02 MB
english, 2011