SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Modeling and simulation of acid diffusion in chemically amplified resists with polymer-bound acid generator
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916293
File:
PDF, 509 KB
english, 2012