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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII - 0.25 µm Trench Etching By ECR Plasma
Fujiwara, H., Fujimoto, K., Araki, H., Tobinaga, Y., Yanof, Arnold W.Volume:
1089
Year:
1989
Language:
english
DOI:
10.1117/12.968543
File:
PDF, 11.81 MB
english, 1989