SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Reduction of lateral swelling and incoporation of DESIRE in MOS processing
Goethals, Anne-Marie, Nichols, David N., Op de Beeck, Maaike, De Geyter, P., Baik, Ki-Ho, Van den Hove, Luc, Roland, Bruno, Lombaerts, Ria, Watts, Michael P. C.Volume:
1262
Year:
1990
Language:
english
DOI:
10.1117/12.20116
File:
PDF, 1.09 MB
english, 1990