SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Phase-enhanced defect sensitivity for EUV mask inspection
Ackmann, Paul W., Hayashi, Naoya, Wang, Yow-Gwo, Miyakawa, Ryan, Chao, Weilun, Goldberg, Kenneth, Neureuther, Andy, Naulleau, PatrickVolume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2069291
File:
PDF, 987 KB
english, 2014