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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Optimization of CD control in DUV positive resists: influence of photoresist viscoelastic properties on PEB conditions
Vinet, Francoise, Buffet, N., Fanton, Pierre, Pain, Laurent, Paniez, Patrick J., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210408
File:
PDF, 439 KB
english, 1995