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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - High-performance TSI process for e-beam using vapor-applied crosslinking silylating agents
Irmscher, Mathias, Hoefflinger, Bernd, Springer, Reinhard, Stauffer, Craig, Peterson, William, Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241855
File:
PDF, 1.40 MB
english, 1996