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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Application of an effective wavelet matrix transform approach for optical lithography simulation: analysis of topological effects of phase-shifting masks
Lee, Seung-Gol, Kim, Hyun-Jun, Lee, Dong-Hoon, Lee, Jong-Ung, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389065
File:
PDF, 603 KB
english, 2000