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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Influence of e-beam-induced contamination on the printability of resist structures at 157-nm exposure
Schilz, Christof M., Eisner, Klaus, Hien, Stefan, Schleussner, Thomas, Ludwig, Ralf, Semmler, Armin, Dao, Giang T., Grenon, Brian J.Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458304
File:
PDF, 157 KB
english, 2002