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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Tandem type resin for chemically amplified KrF positive resist
Uetani, Yasunori, Suetsugu, Masumi, Ochiai, Koichiro, Yamada, Airi, Hanawa, Ryotaro, Ando, Nobuo, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474264
File:
PDF, 321 KB
english, 2002