SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - Verifying RET mask layouts
Mayhew, Jeffrey P., Rieger, Michael L., Li, Jiangwei, Zhang, Lin, Tang, Zongwu, Shiely, James P., Starikov, Alexander, Tobin, Jr., Kenneth W.Volume:
4692
Year:
2002
Language:
english
DOI:
10.1117/12.475670
File:
PDF, 90 KB
english, 2002