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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Improved phase uniformity control using a new AAPSM etch stop layer technique
Lassiter, Matthew, Kimmel, Kurt R., Staud, Wolfgang, Cangemi, Michael J., Taylor, DarrenVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.518130
File:
PDF, 89 KB
english, 2003