SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - Modeling of phosphorous diffusion in ion-implanted Si at dopant transient enhanced out-diffusion during vacuum rapid thermal annealing
Kagadei, Valerii A., Markov, Alexey B., Valiev, Kamil A., Orlikovsky, Alexander A.Year:
2012
Language:
english
DOI:
10.1117/12.562665
File:
PDF, 243 KB
english, 2012