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SPIE Proceedings [SPIE Rapid thermal and Integrated Processing - San Jose, United States (Tuesday 10 September 1991)] Rapid Thermal and Integrated Processing - Damage and RTA kinetics in Ar+ and Si+ ion-implanted CZ silicon characterized by thermal wave modulated optical reflectance
Hahn, Sookap, Smith, Walter L., Hara, Tohru, Hagiwara, H., Suzuki, H., Kwon, Yeong-Keun, Kim, Kwang-Il, Bae, Y.-H., Chung, W. J., Yarling, Charles B., Larson, L. A., Meinecke, Richard, Moslehi, MehrdaVolume:
1595
Year:
1992
Language:
english
DOI:
10.1117/12.56670
File:
PDF, 697 KB
english, 1992