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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Direct measurement of the in-situ developed latent image: the residual swelling fraction
Prabhu, Vivek M., Lin, Qinghuang, Vogt, Bryan D., Kang, Shuhui, Rao, Ashwin, Lin, Eric K., Satija, Sushil K., Turnquest, KarenVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.712311
File:
PDF, 313 KB
english, 2007