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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Modeling the effect of finite size gratings on scatterometry measurements
Kenyon, Elizabeth, Allgair, John A., Raymond, Christopher J., Cresswell, Michael W., Patrick, Heather J., Germer, Thomas A.Volume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.772769
File:
PDF, 610 KB
english, 2008