SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask
You, Jee-Hye, Chen, Alek C., Lin, Burn, Kang, Young-Min, Jung, Minhee, Yen, Anthony, Oh, Hye-KeunVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804611
File:
PDF, 270 KB
english, 2008