SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition
Park, Jin-Hyung, Zurbrick, Larry S., Montgomery, M. Warren, Chung, Paul D. H., Jeon, Chan-Uk, Cho, Han Ku, Pang, Linyong, Peng, Danping, Tolani, Vikram, Cecil, Tom, Kim, David, Baik, KiHoVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.830034
File:
PDF, 2.36 MB
english, 2009