SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Fabrication of 35nm via-hole patterns for interconnect test chips with EUV lithography
La Fontaine, Bruno M., Tanaka, Yuusuke, Aoyama, Hajime, Tawarayama, Kazuo, Magoshi, Shunko, Kawamura, Daisuke, Matsunaga, Kentaro, Kamo, Takashi, Arisawa, Yukiyasu, Uno, Taiga, Tanaka, Hiroyuki, NakamVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846315
File:
PDF, 5.31 MB
english, 2010