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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Progress in mask replication using jet and flash imprint lithography
Selinidis, Kosta S., Herr, Daniel J. C., Brooks, Cynthia B., Doyle, Gary F., Brown, Laura, Jones, Chris, Imhof, Joseph, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S.V.Volume:
7970
Year:
2011
Language:
english
DOI:
10.1117/12.881647
File:
PDF, 8.07 MB
english, 2011