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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Accelerating EUV learning with synchrotron light: mask roughness challenges ahead
Naulleau, Patrick P., Maurer, Wilhelm, Abboud, Frank E., Goldberg, Kenneth A., Gullikson, Eric, Mochi, Iacopo, McClinton, Brittany, Rastegar, AbbasVolume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.900488
File:
PDF, 575 KB
english, 2011