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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Resist outgassing characterization for qualification in high power EUV lithography
Takahashi, Toshiya, Sugie, Norihiko, Katayama, Kazuhiro, Takagi, Isamu, Kikuchi, Yukiko, Shiobara, Eishi, Tanaka, Hiroyuki, Inoue, Soichi, Watanabe, Takeo, Harada, Tetsuo, Kinoshita, Hiroo, Naulleau,Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.916347
File:
PDF, 1.83 MB
english, 2012