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Evaluation of copper Chemical-Vapor-Deposition films on glass and Si(100) substrates
H. A. Marzouk, J. S. Kim, P. J. Reucroft, R. J. Jacob, J. D. Robertson, C. EloiVolume:
58
Language:
english
Pages:
7
DOI:
10.1007/bf00348173
Date:
June, 1994
File:
PDF, 1.19 MB
english, 1994