Stoichiometry of the ALD-Al 2...

Journal of Physics D Applied Physics 2016 / 06 Vol. 49; Iss. 25

Stoichiometry of the ALD-Al 2 O 3 /4H–SiC interface by synchrotron-based XPS

Usman, Muhammad, Suvanam, Sethu Saveda, Yazdi, Milad Ghadami, Göthelid, Mats, Sultan, Muhammad, Hallén, Anders
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Volume:
49
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/49/25/255308
Date:
June, 2016
File:
PDF, 1.07 MB
english, 2016
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