SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - DOF enhancement effect of attenuated assist feature
Ishida, Shinji, Hashimoto, Shuichi, Yasuzato, Tadao, Kasama, Kunihiko, Yoshihara, HideoVolume:
2793
Year:
1996
Language:
english
DOI:
10.1117/12.245202
File:
PDF, 477 KB
english, 1996