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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - EUV mask cleaning by dry and wet processes
Nii, Hajime, Kinoshita, Hiroo, Watanabe, Takeo, Matsuo, Y., Sugie, Y., Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438368
File:
PDF, 238 KB
english, 2001