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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improving chemically amplified resist modeling for 2D layout patterns
Yuan, Lei, Neureuther, Andrew R., Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485152
File:
PDF, 673 KB
english, 2003