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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report
Sharif, Iqbal, DesMarteau, Darryl, Ford, Larry, Shafer, Gregory J., Thomas, Brian, Conley, Will, Zimmerman, Paul, Miller, Daniel, Lee, Guen Su, Chambers, Charles R., Trinque, Brian C., Chiba, Takashi,Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485192
File:
PDF, 129 KB
english, 2003