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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Evaluation of ArF CLM in the sub-100-nm DRAM cell
Lee, Ju-Hyung, Yen, Anthony, Chung, Dong-Hoon, Kim, Ho-Chul, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-SungVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485406
File:
PDF, 1.40 MB
english, 2003