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SPIE Proceedings [SPIE 19th European Conference on Mask Technology for Integrated Circuits and Microcomponts - Sonthofen, Germany (Monday 13 January 2003)] 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Implementation of 248-nm based CD metrology for advanced reticle production
Hourd, Andrew C., Grimshaw, Anthony, Scheuring, Gerd, Gittinger, Christian, Dobereiner, Stefan, Hillmann, Frank, Bruck, Hans-Jurgen, Hartmann, Hans, Ordynskyy, Volodymyr, Peter, Kai, Chen, Shiuh-Bin,Volume:
5148
Year:
2003
Language:
english
DOI:
10.1117/12.515114
File:
PDF, 586 KB
english, 2003