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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - New BARC materials for the 65-nm node in 193-nm lithography
Neef, Charles J., Sturtevant, John L., Krishnamurthy, Vandana, Nagatkina, Mariya I., Bryant, Evan, Windsor, Michelle, Nesbit, CherylVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535423
File:
PDF, 213 KB
english, 2004