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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Method of robust pattern design for lens aberration
Komine, Nobuhiro, Smith, Bruce W., Konomi, Kenji, Asanuma, Keita, Tawarayama, Kazuo, Higashiki, TatsuhikoVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536244
File:
PDF, 210 KB
english, 2004