SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Extension of 193-nm immersion optical lithography to the 22-nm half-pitch node
Brueck, Steven R. J., Smith, Bruce W., Biswas, Abani M.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536798
File:
PDF, 732 KB
english, 2004