SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - Study on ion etching technology of infrared antireflection subwavelength relief structure
Dong, Lianhe, Wang, Yangyuan, Yao, Jun-en, Dong, Yu, Sun, Yanjun, Progler, Christopher J.Volume:
5645
Year:
2004
Language:
english
DOI:
10.1117/12.575647
File:
PDF, 56 KB
english, 2004