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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Encapsulation of light emitting materials and photo-patterning using B-cyclodextrin
Kim, Jin-Baek, Sturtevant, John L., Park, Ji-YoungVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.600269
File:
PDF, 402 KB
english, 2005