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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Characterization and qualification of the Jeol JBX9000-MVII e-beam writer for the 90nm node and its integration in a photomask manufacturing line
Raffaele, Luigi, Weed, J. Tracy, Martin, Patrick M., Pogliani, Carlo, Cassol, Gian Luca, Bianucci, Giovanni, Murai, Shiaki, Murata, Shoichi, Hikichi, Ryugo, Katsuki, Hidenao, Noguchi, ShigeruVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632399
File:
PDF, 768 KB
english, 2005