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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Taking image quality factor into the OPC model tuning flow
Wang, Ching-Heng, Flagello, Donis G., Liu, Qingwei, Zhang, LiguoVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.710545
File:
PDF, 410 KB
english, 2007