SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Applying photolithography-friendly design to e-beam direct writing in 65-nm node and beyond
Hoshino, Hiromi, Schellenberg, Frank M., Ogino, Kozo, Machida, Yasuhide, Miyajima, Masaaki, Maruyama, Takashi, Kojima, Yoshinori, Sugatani, ShinjiVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.773189
File:
PDF, 1.07 MB
english, 2008