SPIE Proceedings [SPIE 24th European Mask and Lithography...

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SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

Häßler-Grohne, W., Frase, C. G., Gnieser, D., Bosse, H., Richter, J., Wiswesser, A.
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Volume:
6792
Year:
2008
Language:
english
DOI:
10.1117/12.798783
File:
PDF, 986 KB
english, 2008
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