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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Calibration of a scanning electron microscope in the wide range of magnifications for the microscope operation in the integrated circuit production line
Gavrilenko, V. P., Allgair, John A., Raymond, Christopher J., Novikov, Yu. A., Rakov, A. V., Todua, P. A., Volk, Ch. P.Volume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.813514
File:
PDF, 1.23 MB
english, 2009