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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist
Koh, Chawon, Schellenberg, Frank M., La Fontaine, Bruno M., Ren, Liping, Georger, Jacque, Goodwin, Frank, Wurm, Stefan, Pierson, Bill, Park, Joo-On, Wallow, Tom, Younkin, Todd R., Naulleau, PatrickVolume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.814314
File:
PDF, 866 KB
english, 2009