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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Detection of lateral CD shift with scatterometry on grating structures in production layout
Huang, Jacky, Raymond, Christopher J., Hu, Jiarui, Wang, Willie, Lee, Ya-Ping, Ke, Chih-Ming, Gau, Tsai-ShengVolume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.848522
File:
PDF, 1.38 MB
english, 2010