SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Plasmonic lithography modeling and measurement of near-field distribution of plasmonic nano-aperture
Kim, Yongwoo, Kim, Seok, Jung, Howon, Jang, Jinhee, Lee, Jae Yong, Hahn, Jae W., Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916237
File:
PDF, 1.37 MB
english, 2012