SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Optimized registration model for 2:1 stepper field matching
Flack, Warren W., Flores, Gary E., Pellegrini, Joseph C., Merrill, Mark A., Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175465
File:
PDF, 537 KB
english, 1994