SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - CD optimization methodology for extending optical lithography
Wong, C., Seevaratnam, G., Wiltshire, T., Felix, N., Brunner, T., Rawat, P., Escalante, M., Kim, W., Rottenkolber, E., Elmalk, A., Wang, V., Leewis, C., Hinnen, P., Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2009397
File:
PDF, 530 KB
english, 2013