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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Accurate proximity correction method with total-process proximity-based correction factor (TCF)
Hashimoto, Kohji, Usui, Satoshi, Hasebe, Shigeru, Murota, Masayuki, Nakayama, Takeo, Matsuoka, Fumitomo, Inoue, Soichi, Kobayashi, Sachiko, Yamamoto, Kazuko, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310752
File:
PDF, 458 KB
english, 1998